JPH0648834Y2 - プラズマcvd装置 - Google Patents
プラズマcvd装置Info
- Publication number
- JPH0648834Y2 JPH0648834Y2 JP1989016877U JP1687789U JPH0648834Y2 JP H0648834 Y2 JPH0648834 Y2 JP H0648834Y2 JP 1989016877 U JP1989016877 U JP 1989016877U JP 1687789 U JP1687789 U JP 1687789U JP H0648834 Y2 JPH0648834 Y2 JP H0648834Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- electrode
- plasma cvd
- wafers
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 title claims description 11
- 235000012431 wafers Nutrition 0.000 claims description 35
- 238000009434 installation Methods 0.000 claims description 8
- 239000010408 film Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989016877U JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマcvd装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989016877U JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマcvd装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02108335U JPH02108335U (en]) | 1990-08-29 |
JPH0648834Y2 true JPH0648834Y2 (ja) | 1994-12-12 |
Family
ID=31230188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989016877U Expired - Fee Related JPH0648834Y2 (ja) | 1989-02-17 | 1989-02-17 | プラズマcvd装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0648834Y2 (en]) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60258924A (ja) * | 1984-06-06 | 1985-12-20 | Hitachi Ltd | プラズマ処理装置 |
JPH0719751B2 (ja) * | 1984-07-02 | 1995-03-06 | 鐘淵化学工業株式会社 | 成膜方法 |
JPS6257213A (ja) * | 1985-09-06 | 1987-03-12 | Fuji Electric Corp Res & Dev Ltd | プラズマcvd装置 |
JPH01127237U (en]) * | 1988-02-24 | 1989-08-31 |
-
1989
- 1989-02-17 JP JP1989016877U patent/JPH0648834Y2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH02108335U (en]) | 1990-08-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |